文件名称:Project-Igi
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Process variations have increased significantly with scaling technologies. This
has led to deviations in analog circuit performance from their expected values.
For submicron design, it is essential to simulate the circuit at all process
corners for yield verification. In this work we develop a methodology based
upon a sensitivity analysis of transistor mismatch to circuit performance for
statistical design parameter estimation. This methodology has been implemented
in a CAD tool. With the objective of rapid simulation, the performance of a
circuit under process variation can be effectively estimated using the tool while
achieving a significant speedup over conventional Monte Carlo methods.
has led to deviations in analog circuit performance from their expected values.
For submicron design, it is essential to simulate the circuit at all process
corners for yield verification. In this work we develop a methodology based
upon a sensitivity analysis of transistor mismatch to circuit performance for
statistical design parameter estimation. This methodology has been implemented
in a CAD tool. With the objective of rapid simulation, the performance of a
circuit under process variation can be effectively estimated using the tool while
achieving a significant speedup over conventional Monte Carlo methods.
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